Ar-ion etcher

Moorfield nanoETCH

The nanoETCH is a benchtop tool equipped with a high-uniformity plasma etching stage and an RF power supply for plasma generation. It has been optimised to provide Soft Etching of carbon nanomaterials, particularly graphene with Ar and/or O2 gases.

For more information, contact Hannu Huhtinen.

Specifications:

  • Soft-etching technology: Precision RF power <30 W
  • Base pressures <5 × 10-7mbar
  • Up to 6”/150 mm diameter stages

For more information, contact Hannu Huhtinen.