UV-photolithography with Laurell WS-650MZ-23NPPB spin coater

Photolithography is used to pattern samples for e.g. electrical measurements. Typically the photoresist in first spinned on the sample and then exposed to UV-light through a mask, which covers the parts of the films that are kept. Then the photoresist is developed and the exposed parts removed. The film is etched e.g. either wet chemical etching or ion beam etching and finally the developed photoresist is removed.

For more information, contact Hannu Huhtinen.


  • UV-lamp
  • Up to ø150mm wafers and 5″ × 5″ (127mm × 127mm) substrates
  • Maximum rotational speed of 12,000 RPM

For more information, contact Hannu Huhtinen.